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Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy
We perform scanning tunnelling microscopy (STM) in a regime where primary electrons are field-emitted from the tip and excite secondary electrons out of the target—the scanning field-emission microscopy regime (SFM). In the SFM mode, a secondary-electron contrast as high as 30% is observed when imag...
Autores principales: | , , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society Publishing
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5134307/ https://www.ncbi.nlm.nih.gov/pubmed/27956876 http://dx.doi.org/10.1098/rspa.2016.0475 |
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author | Zanin, D. A. De Pietro, L. G. Peter, Q. Kostanyan, A. Cabrera, H. Vindigni, A. Bähler, Th. Pescia, D. Ramsperger, U. |
author_facet | Zanin, D. A. De Pietro, L. G. Peter, Q. Kostanyan, A. Cabrera, H. Vindigni, A. Bähler, Th. Pescia, D. Ramsperger, U. |
author_sort | Zanin, D. A. |
collection | PubMed |
description | We perform scanning tunnelling microscopy (STM) in a regime where primary electrons are field-emitted from the tip and excite secondary electrons out of the target—the scanning field-emission microscopy regime (SFM). In the SFM mode, a secondary-electron contrast as high as 30% is observed when imaging a monoatomic step between a clean W(110)- and an Fe-covered W(110)-terrace. This is a figure of contrast comparable to STM. The apparent width of the monoatomic step attains the 1 nm mark, i.e. it is only marginally worse than the corresponding width observed in STM. The origin of the unexpected strong contrast in SFM is the material dependence of the secondary-electron yield and not the dependence of the transported current on the tip–target distance, typical of STM: accordingly, we expect that a technology combining STM and SFM will highlight complementary aspects of a surface while simultaneously making electrons, selected with nanometre spatial precision, available to a macroscopic environment for further processing. |
format | Online Article Text |
id | pubmed-5134307 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2016 |
publisher | The Royal Society Publishing |
record_format | MEDLINE/PubMed |
spelling | pubmed-51343072016-12-12 Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy Zanin, D. A. De Pietro, L. G. Peter, Q. Kostanyan, A. Cabrera, H. Vindigni, A. Bähler, Th. Pescia, D. Ramsperger, U. Proc Math Phys Eng Sci Research Articles We perform scanning tunnelling microscopy (STM) in a regime where primary electrons are field-emitted from the tip and excite secondary electrons out of the target—the scanning field-emission microscopy regime (SFM). In the SFM mode, a secondary-electron contrast as high as 30% is observed when imaging a monoatomic step between a clean W(110)- and an Fe-covered W(110)-terrace. This is a figure of contrast comparable to STM. The apparent width of the monoatomic step attains the 1 nm mark, i.e. it is only marginally worse than the corresponding width observed in STM. The origin of the unexpected strong contrast in SFM is the material dependence of the secondary-electron yield and not the dependence of the transported current on the tip–target distance, typical of STM: accordingly, we expect that a technology combining STM and SFM will highlight complementary aspects of a surface while simultaneously making electrons, selected with nanometre spatial precision, available to a macroscopic environment for further processing. The Royal Society Publishing 2016-11 /pmc/articles/PMC5134307/ /pubmed/27956876 http://dx.doi.org/10.1098/rspa.2016.0475 Text en © 2016 The Authors. http://creativecommons.org/licenses/by/4.0/ Published by the Royal Society under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0/, which permits unrestricted use, provided the original author and source are credited. |
spellingShingle | Research Articles Zanin, D. A. De Pietro, L. G. Peter, Q. Kostanyan, A. Cabrera, H. Vindigni, A. Bähler, Th. Pescia, D. Ramsperger, U. Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title | Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title_full | Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title_fullStr | Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title_full_unstemmed | Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title_short | Thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
title_sort | thirty per cent contrast in secondary-electron imaging by scanning field-emission microscopy |
topic | Research Articles |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5134307/ https://www.ncbi.nlm.nih.gov/pubmed/27956876 http://dx.doi.org/10.1098/rspa.2016.0475 |
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