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XPS Depth Profile Analysis of Zn(3)N(2) Thin Films Grown at Different N(2)/Ar Gas Flow Rates by RF Magnetron Sputtering
Zinc nitride thin films were grown on fused silica substrates at 300 °C by radio frequency magnetron sputtering. Films were grown at different N(2)/Ar flow rate ratios of 0.20, 0.40, 0.60, 0.80, and 1.0. All the samples have grain-like surface morphology with an average surface roughness ranging fro...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Springer US
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5213810/ https://www.ncbi.nlm.nih.gov/pubmed/28054331 http://dx.doi.org/10.1186/s11671-016-1769-y |