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Enhanced End-Contacts by Helium Ion Bombardment to Improve Graphene-Metal Contacts

Low contact resistance between graphene and metals is of paramount importance to fabricate high performance graphene-based devices. In this paper, the impact of both defects induced by helium ion (He(+)) bombardment and annealing on the contact resistance between graphene and various metals (Ag, Pd,...

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Detalles Bibliográficos
Autores principales: Jia, Kunpeng, Su, Yajuan, Zhan, Jun, Shahzad, Kashif, Zhu, Huilong, Zhao, Chao, Luo, Jun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5224638/
https://www.ncbi.nlm.nih.gov/pubmed/28335286
http://dx.doi.org/10.3390/nano6090158