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Enhanced End-Contacts by Helium Ion Bombardment to Improve Graphene-Metal Contacts
Low contact resistance between graphene and metals is of paramount importance to fabricate high performance graphene-based devices. In this paper, the impact of both defects induced by helium ion (He(+)) bombardment and annealing on the contact resistance between graphene and various metals (Ag, Pd,...
Autores principales: | Jia, Kunpeng, Su, Yajuan, Zhan, Jun, Shahzad, Kashif, Zhu, Huilong, Zhao, Chao, Luo, Jun |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2016
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5224638/ https://www.ncbi.nlm.nih.gov/pubmed/28335286 http://dx.doi.org/10.3390/nano6090158 |
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