Model for large-area monolayer coverage of polystyrene nanospheres by spin coating

Nanosphere lithography, an inexpensive and high throughput technique capable of producing nanostructure (below 100 nm feature size) arrays, relies on the formation of a monolayer of self-assembled nanospheres, followed by custom-etching to produce nanometre size features on large-area substrates. A...

Descripción completa

Detalles Bibliográficos
Autores principales: Chandramohan, Abhishek, Sibirev, Nikolai V., Dubrovskii, Vladimir G., Petty, Michael C., Gallant, Andrew J., Zeze, Dagou A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5244356/
https://www.ncbi.nlm.nih.gov/pubmed/28102358
http://dx.doi.org/10.1038/srep40888

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5244356/
https://www.ncbi.nlm.nih.gov/pubmed/28102358
http://dx.doi.org/10.1038/srep40888

Ejemplares similares