The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition

Thin-film transistors (TFTs) with atomic layer deposition (ALD) HfZnO (HZO) as channel layer and Al(2)O(3) as gate insulator were successfully fabricated. Compared with ZnO-TFT, the stability of HZO-TFT was obviously improved as Hf doping can suppress the generation of oxygen related defects. The tr...

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Detalles Bibliográficos
Autores principales: Ding, Xingwei, Qin, Cunping, Song, Jiantao, Zhang, Jianhua, Jiang, Xueyin, Zhang, Zhilin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5256629/
https://www.ncbi.nlm.nih.gov/pubmed/28116611
http://dx.doi.org/10.1186/s11671-017-1852-z
Descripción
Sumario:Thin-film transistors (TFTs) with atomic layer deposition (ALD) HfZnO (HZO) as channel layer and Al(2)O(3) as gate insulator were successfully fabricated. Compared with ZnO-TFT, the stability of HZO-TFT was obviously improved as Hf doping can suppress the generation of oxygen related defects. The transfer characteristics of TFTs at different temperatures were also investigated, and temperature stability enhancement was observed for the TFT with Hf doping. The density of states (DOS) was calculated based on the experimentally obtained E (a), which can explain the experimental observation. A high-field effect mobility of 9.4 cm(2)/Vs, a suitable turn-on voltage of 0.26 V, a high on/off ratio of over 10(7) and a steep sub-threshold swing of 0.3 V/decade were obtained in HZO-TFT. The results showed that temperature stability enhancement in HfZnO thin-film transistors are attributed to the smaller DOS.

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