Resist-free antireflective nanostructured film fabricated by thermal-NIL

Resist-free antireflective (AR) nanostructured films are directly fabricated on polycarbonate (PC) film using thermal-nanoimprint lithography (T-NIL) and the moth-eye shape of AR nanostructure is elaborately optimized with different oxygen reactive ion etching conditions. Anodic aluminum oxide (AAO)...

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Detalles Bibliográficos
Autores principales: Kang, Young Hun, Han, Jae Hyung, Cho, Song Yun, Choi, Choon-Gi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Korea Nano Technology Research Society 2014
Materias:
Research
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5271020/
https://www.ncbi.nlm.nih.gov/pubmed/28191399
http://dx.doi.org/10.1186/s40580-014-0019-1

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5271020/
https://www.ncbi.nlm.nih.gov/pubmed/28191399
http://dx.doi.org/10.1186/s40580-014-0019-1

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