Microwave Plasma-Activated Chemical Vapor Deposition of Nitrogen-Doped Diamond. II: CH(4)/N(2)/H(2) Plasmas

[Image: see text] We report a combined experimental and modeling study of microwave-activated dilute CH(4)/N(2)/H(2) plasmas, as used for chemical vapor deposition (CVD) of diamond, under very similar conditions to previous studies of CH(4)/H(2), CH(4)/H(2)/Ar, and N(2)/H(2) gas mixtures. Using cavi...

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Detalles Bibliográficos
Autores principales: Truscott, Benjamin S., Kelly, Mark W., Potter, Katie J., Ashfold, Michael N. R., Mankelevich, Yuri A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2016
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5293323/
https://www.ncbi.nlm.nih.gov/pubmed/27718565
http://dx.doi.org/10.1021/acs.jpca.6b09009

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5293323/
https://www.ncbi.nlm.nih.gov/pubmed/27718565
http://dx.doi.org/10.1021/acs.jpca.6b09009

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