Developments of the Physical and Electrical Properties of NiCr and NiCrSi Single-Layer and Bi-Layer Nano-Scale Thin-Film Resistors

In this study, commercial-grade NiCr (80 wt % Ni, 20 wt % Cr) and NiCrSi (55 wt % Ni, 40 wt % Cr, 5 wt % Si) were used as targets and the sputtering method was used to deposit NiCr and NiCrSi thin films on Al(2)O(3) and Si substrates at room temperature under different deposition time. X-ray diffrac...

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Detalles Bibliográficos
Autores principales: Cheng, Huan-Yi, Chen, Ying-Chung, Li, Chi-Lun, Li, Pei-Jou, Houng, Mau-Phon, Yang, Cheng-Fu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302516/
https://www.ncbi.nlm.nih.gov/pubmed/28344296
http://dx.doi.org/10.3390/nano6030039

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302516/
https://www.ncbi.nlm.nih.gov/pubmed/28344296
http://dx.doi.org/10.3390/nano6030039

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