Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances

The hot and dense plasma formed in modified dense plasma focus (DPF) device has been used worldwide for the nanofabrication of several materials. In this paper, we summarize the fabrication of III–V semiconductor nanostructures using the high fluence material ions produced by hot, dense and extremel...

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Detalles Bibliográficos
Autores principales: Mangla, Onkar, Roy, Savita, Ostrikov, Kostya (Ken)
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302538/
https://www.ncbi.nlm.nih.gov/pubmed/28344261
http://dx.doi.org/10.3390/nano6010004

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302538/
https://www.ncbi.nlm.nih.gov/pubmed/28344261
http://dx.doi.org/10.3390/nano6010004

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