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Dense Plasma Focus-Based Nanofabrication of III–V Semiconductors: Unique Features and Recent Advances
The hot and dense plasma formed in modified dense plasma focus (DPF) device has been used worldwide for the nanofabrication of several materials. In this paper, we summarize the fabrication of III–V semiconductor nanostructures using the high fluence material ions produced by hot, dense and extremel...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2015
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302538/ https://www.ncbi.nlm.nih.gov/pubmed/28344261 http://dx.doi.org/10.3390/nano6010004 |