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Selective Plasma Etching of Polymeric Substrates for Advanced Applications
In today’s nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials. These interactions first involve preferential interacti...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2016
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5302619/ https://www.ncbi.nlm.nih.gov/pubmed/28335238 http://dx.doi.org/10.3390/nano6060108 |