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Erratum to: The Influence of Hafnium Doping on Density-of-States in Zinc Oxide Thin-Film Fransistors Deposited Via Atomic Layer Deposition

Detalles Bibliográficos
Autores principales:	Ding, Xingwei, Qin, Cunping, Song, Jiantao, Zhang, Jianhua, Jiang, Xueyin, Zhang, Zhilin
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Springer US 2017
Materias:	Erratum
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5340739/ https://www.ncbi.nlm.nih.gov/pubmed/28274091 http://dx.doi.org/10.1186/s11671-017-1927-x

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