Effect of Ge Content on the Formation of Ge Nanoclusters in Magnetron-Sputtered GeZrO(x)-Based Structures

Ge-rich ZrO(2) films, fabricated by confocal RF magnetron sputtering of pure Ge and ZrO(2) targets in Ar plasma, were studied by multi-angle laser ellipsometry, Raman scattering, Auger electron spectroscopy, Fourier transform infrared spectroscopy, and X-ray diffraction for varied deposition conditi...

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Detalles Bibliográficos
Autores principales: Khomenkova, L., Lehninger, D., Kondratenko, O., Ponomaryov, S., Gudymenko, O., Tsybrii, Z., Yukhymchuk, V., Kladko, V., von Borany, J., Heitmann, J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5355413/
https://www.ncbi.nlm.nih.gov/pubmed/28314364
http://dx.doi.org/10.1186/s11671-017-1960-9

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5355413/
https://www.ncbi.nlm.nih.gov/pubmed/28314364
http://dx.doi.org/10.1186/s11671-017-1960-9

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