Effects of Rapid Thermal Annealing and Different Oxidants on the Properties of La(x)Al(y)O Nanolaminate Films Deposited by Atomic Layer Deposition

A comparative study of different sequences of two metal precursors [trimethylaluminum (TMA) and Tris(isopropylcyclopentadienyl) lanthanum (La((i)PrCp)(3))] for atomic layer deposition (ALD) lanthanum aluminum oxide (La(x)Al(y)O) films is carried out. The percentage compositions of C and N impurity o...

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Detalles Bibliográficos
Autores principales: Fei, Chenxi, Liu, Hongxia, Wang, Xing, Zhao, Lu, Zhao, Dongdong, Feng, Xingyao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5364116/
https://www.ncbi.nlm.nih.gov/pubmed/28340529
http://dx.doi.org/10.1186/s11671-017-1994-z

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5364116/
https://www.ncbi.nlm.nih.gov/pubmed/28340529
http://dx.doi.org/10.1186/s11671-017-1994-z

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