Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide Nanoparticles

Amorphous Si (a-Si) films with metal silicide are expected to enhance the absorption ability of pure a-Si films. In this present study, NiSi (20 nm)/Si (40 nm) and AlSi (20 nm)/Si (40 nm) bilayer thin films are deposited through radio frequency (RF) sputtering at room temperature. The influence of t...

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Detalles Bibliográficos
Autores principales: Sun, Hui, Wu, Hsuan-Chung, Chen, Sheng-Chi, Ma Lee, Che-Wei, Wang, Xin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5368101/
https://www.ncbi.nlm.nih.gov/pubmed/28351127
http://dx.doi.org/10.1186/s11671-017-2003-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5368101/
https://www.ncbi.nlm.nih.gov/pubmed/28351127
http://dx.doi.org/10.1186/s11671-017-2003-2

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