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Absorption Amelioration of Amorphous Si Film by Introducing Metal Silicide Nanoparticles
Amorphous Si (a-Si) films with metal silicide are expected to enhance the absorption ability of pure a-Si films. In this present study, NiSi (20 nm)/Si (40 nm) and AlSi (20 nm)/Si (40 nm) bilayer thin films are deposited through radio frequency (RF) sputtering at room temperature. The influence of t...
Autores principales: | Sun, Hui, Wu, Hsuan-Chung, Chen, Sheng-Chi, Ma Lee, Che-Wei, Wang, Xin |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5368101/ https://www.ncbi.nlm.nih.gov/pubmed/28351127 http://dx.doi.org/10.1186/s11671-017-2003-2 |
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