Contact electrification induced interfacial reactions and direct electrochemical nanoimprint lithography in n-type gallium arsenate wafer

Although metal assisted chemical etching (MacEtch) has emerged as a versatile micro-nanofabrication method for semiconductors, the chemical mechanism remains ambiguous in terms of both thermodynamics and kinetics. Here we demonstrate an innovative phenomenon, i.e., the contact electrification betwee...

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Detalles Bibliográficos
Autores principales: Zhang, Jie, Zhang, Lin, Wang, Wei, Han, Lianhuan, Jia, Jing-Chun, Tian, Zhao-Wu, Tian, Zhong-Qun, Zhan, Dongping
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Royal Society of Chemistry 2017
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5369340/
https://www.ncbi.nlm.nih.gov/pubmed/28451347
http://dx.doi.org/10.1039/c6sc04091h

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5369340/
https://www.ncbi.nlm.nih.gov/pubmed/28451347
http://dx.doi.org/10.1039/c6sc04091h

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