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Contact electrification induced interfacial reactions and direct electrochemical nanoimprint lithography in n-type gallium arsenate wafer
Although metal assisted chemical etching (MacEtch) has emerged as a versatile micro-nanofabrication method for semiconductors, the chemical mechanism remains ambiguous in terms of both thermodynamics and kinetics. Here we demonstrate an innovative phenomenon, i.e., the contact electrification betwee...
Autores principales: | Zhang, Jie, Zhang, Lin, Wang, Wei, Han, Lianhuan, Jia, Jing-Chun, Tian, Zhao-Wu, Tian, Zhong-Qun, Zhan, Dongping |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Royal Society of Chemistry
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5369340/ https://www.ncbi.nlm.nih.gov/pubmed/28451347 http://dx.doi.org/10.1039/c6sc04091h |
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