Optical Constants and Band Gap Evolution with Phase Transition in Sub-20-nm-Thick TiO(2) Films Prepared by ALD

Titanium dioxide (TiO(2)) ultrathin films with different thicknesses below 20 nm were grown by atomic layer deposition (ALD) on silicon substrates at 300 °C. Spectroscopic ellipsometry (SE) measurements were operated to investigate the effect of thickness on the optical properties of ultrathin films...

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Detalles Bibliográficos
Autores principales: Shi, Yue-Jie, Zhang, Rong-Jun, Zheng, Hua, Li, Da-Hai, Wei, Wei, Chen, Xin, Sun, Yan, Wei, Yan-Feng, Lu, Hong-Liang, Dai, Ning, Chen, Liang-Yao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer US 2017
Materias:
Nano Express
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5374092/
https://www.ncbi.nlm.nih.gov/pubmed/28363244
http://dx.doi.org/10.1186/s11671-017-2011-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5374092/
https://www.ncbi.nlm.nih.gov/pubmed/28363244
http://dx.doi.org/10.1186/s11671-017-2011-2

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