Uniform Atomic Layer Deposition of Al(2)O(3) on Graphene by Reversible Hydrogen Plasma Functionalization

[Image: see text] A novel method to form ultrathin, uniform Al(2)O(3) layers on graphene using reversible hydrogen plasma functionalization followed by atomic layer deposition (ALD) is presented. ALD on pristine graphene is known to be a challenge due to the absence of dangling bonds, leading to non...

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Detalles Bibliográficos
Autores principales: Vervuurt, René H. J., Karasulu, Bora, Verheijen, Marcel A., Kessels, Wilhelmus (Erwin) M. M., Bol, Ageeth A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2017
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5384478/
https://www.ncbi.nlm.nih.gov/pubmed/28405059
http://dx.doi.org/10.1021/acs.chemmater.6b04368

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5384478/
https://www.ncbi.nlm.nih.gov/pubmed/28405059
http://dx.doi.org/10.1021/acs.chemmater.6b04368

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