Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition

Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced s...

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Detalles Bibliográficos
Autores principales: Liao, Yu-Kuang, Liu, Yung-Tsung, Hsieh, Dan-Hua, Shen, Tien-Lin, Hsieh, Ming-Yang, Tzou, An-Jye, Chen, Shih-Chen, Tsai, Yu-Lin, Lin, Wei-Sheng, Chan, Sheng-Wen, Shen, Yen-Ping, Cheng, Shun-Jen, Chen, Chyong-Hua, Wu, Kaung-Hsiung, Chen, Hao-Ming, Kuo, Shou-Yi, Charlton, Martin D. B., Hsieh, Tung-Po, Kuo, Hao-Chung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5408170/
https://www.ncbi.nlm.nih.gov/pubmed/28383488
http://dx.doi.org/10.3390/nano7040078

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5408170/
https://www.ncbi.nlm.nih.gov/pubmed/28383488
http://dx.doi.org/10.3390/nano7040078

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