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Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition

Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced s...

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Autores principales: Liao, Yu-Kuang, Liu, Yung-Tsung, Hsieh, Dan-Hua, Shen, Tien-Lin, Hsieh, Ming-Yang, Tzou, An-Jye, Chen, Shih-Chen, Tsai, Yu-Lin, Lin, Wei-Sheng, Chan, Sheng-Wen, Shen, Yen-Ping, Cheng, Shun-Jen, Chen, Chyong-Hua, Wu, Kaung-Hsiung, Chen, Hao-Ming, Kuo, Shou-Yi, Charlton, Martin D. B., Hsieh, Tung-Po, Kuo, Hao-Chung
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5408170/
https://www.ncbi.nlm.nih.gov/pubmed/28383488
http://dx.doi.org/10.3390/nano7040078
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author Liao, Yu-Kuang
Liu, Yung-Tsung
Hsieh, Dan-Hua
Shen, Tien-Lin
Hsieh, Ming-Yang
Tzou, An-Jye
Chen, Shih-Chen
Tsai, Yu-Lin
Lin, Wei-Sheng
Chan, Sheng-Wen
Shen, Yen-Ping
Cheng, Shun-Jen
Chen, Chyong-Hua
Wu, Kaung-Hsiung
Chen, Hao-Ming
Kuo, Shou-Yi
Charlton, Martin D. B.
Hsieh, Tung-Po
Kuo, Hao-Chung
author_facet Liao, Yu-Kuang
Liu, Yung-Tsung
Hsieh, Dan-Hua
Shen, Tien-Lin
Hsieh, Ming-Yang
Tzou, An-Jye
Chen, Shih-Chen
Tsai, Yu-Lin
Lin, Wei-Sheng
Chan, Sheng-Wen
Shen, Yen-Ping
Cheng, Shun-Jen
Chen, Chyong-Hua
Wu, Kaung-Hsiung
Chen, Hao-Ming
Kuo, Shou-Yi
Charlton, Martin D. B.
Hsieh, Tung-Po
Kuo, Hao-Chung
author_sort Liao, Yu-Kuang
collection PubMed
description Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced sulfide nanoparticles (NPs) with controllable thickness down to a few nanometers, based on thermal decomposition. This provides high-coverage, homogeneous thickness, and large-area deposition over a rough surface, with little material loss or liquid chemical waste, and deposition rates of 10 nm/min. This technique can potentially replace conventional thin-film deposition methods, such as atomic layer deposition (ALD) and chemical bath deposition (CBD) as used by the Cu(In,Ga)Se(2) (CIGS) thin-film solar cell industry for decades. We demonstrate 32% improvement of CIGS thin-film solar cell efficiency in comparison to reference devices prepared by conventional CBD deposition method by depositing the ZnS NPs buffer layer using the new process. The new ZnS NPs layer allows reduction of an intrinsic ZnO layer, which can lead to severe shunt leakage in case of a CBD buffer layer. This leads to a 65% relative efficiency increase.
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spelling pubmed-54081702017-05-03 Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition Liao, Yu-Kuang Liu, Yung-Tsung Hsieh, Dan-Hua Shen, Tien-Lin Hsieh, Ming-Yang Tzou, An-Jye Chen, Shih-Chen Tsai, Yu-Lin Lin, Wei-Sheng Chan, Sheng-Wen Shen, Yen-Ping Cheng, Shun-Jen Chen, Chyong-Hua Wu, Kaung-Hsiung Chen, Hao-Ming Kuo, Shou-Yi Charlton, Martin D. B. Hsieh, Tung-Po Kuo, Hao-Chung Nanomaterials (Basel) Article Most thin-film techniques require a multiple vacuum process, and cannot produce high-coverage continuous thin films with the thickness of a few nanometers on rough surfaces. We present a new ”paradigm shift” non-vacuum process to deposit high-quality, ultra-thin, single-crystal layers of coalesced sulfide nanoparticles (NPs) with controllable thickness down to a few nanometers, based on thermal decomposition. This provides high-coverage, homogeneous thickness, and large-area deposition over a rough surface, with little material loss or liquid chemical waste, and deposition rates of 10 nm/min. This technique can potentially replace conventional thin-film deposition methods, such as atomic layer deposition (ALD) and chemical bath deposition (CBD) as used by the Cu(In,Ga)Se(2) (CIGS) thin-film solar cell industry for decades. We demonstrate 32% improvement of CIGS thin-film solar cell efficiency in comparison to reference devices prepared by conventional CBD deposition method by depositing the ZnS NPs buffer layer using the new process. The new ZnS NPs layer allows reduction of an intrinsic ZnO layer, which can lead to severe shunt leakage in case of a CBD buffer layer. This leads to a 65% relative efficiency increase. MDPI 2017-04-06 /pmc/articles/PMC5408170/ /pubmed/28383488 http://dx.doi.org/10.3390/nano7040078 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Liao, Yu-Kuang
Liu, Yung-Tsung
Hsieh, Dan-Hua
Shen, Tien-Lin
Hsieh, Ming-Yang
Tzou, An-Jye
Chen, Shih-Chen
Tsai, Yu-Lin
Lin, Wei-Sheng
Chan, Sheng-Wen
Shen, Yen-Ping
Cheng, Shun-Jen
Chen, Chyong-Hua
Wu, Kaung-Hsiung
Chen, Hao-Ming
Kuo, Shou-Yi
Charlton, Martin D. B.
Hsieh, Tung-Po
Kuo, Hao-Chung
Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title_full Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title_fullStr Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title_full_unstemmed Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title_short Breakthrough to Non-Vacuum Deposition of Single-Crystal, Ultra-Thin, Homogeneous Nanoparticle Layers: A Better Alternative to Chemical Bath Deposition and Atomic Layer Deposition
title_sort breakthrough to non-vacuum deposition of single-crystal, ultra-thin, homogeneous nanoparticle layers: a better alternative to chemical bath deposition and atomic layer deposition
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5408170/
https://www.ncbi.nlm.nih.gov/pubmed/28383488
http://dx.doi.org/10.3390/nano7040078
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