Cargando…
Investigation of Bulk Traps by Conductance Method in the Deep Depletion Region of the Al(2)O(3)/GaN MOS Device
Conductance method was employed to study the physics of traps (e.g., interface and bulk traps) in the Al(2)O(3)/GaN MOS devices. By featuring only one single peak in the parallel conductance (G (p)/ω) characteristics in the deep depletion region, one single-level bulk trap (E (C)-0.53 eV) uniformly...
Autores principales: | Shi, Yuanyuan, Zhou, Qi, Zhang, Anbang, Zhu, Liyang, Shi, Yu, Chen, Wanjun, Li, Zhaoji, Zhang, Bo |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2017
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5423875/ https://www.ncbi.nlm.nih.gov/pubmed/28494570 http://dx.doi.org/10.1186/s11671-017-2111-z |
Ejemplares similares
-
A High-Accuracy AlGaN/GaN Reverse Blocking CRD (RB-CRD) with Hybrid Trench Cathode
por: Zhang, Anbang, et al.
Publicado: (2019) -
Gate leakage current induced trapping in AlGaN/GaN Schottky-gate HFETs and MISHFETs
por: Liao, Wen-Chia, et al.
Publicado: (2014) -
Synthesis and Characterization of Glomerate GaN Nanowires
por: Qin, Lixia, et al.
Publicado: (2009) -
High Breakdown Voltage and Low Dynamic ON-Resistance AlGaN/GaN HEMT with Fluorine Ion Implantation in SiN(x) Passivation Layer
por: Yang, Chao, et al.
Publicado: (2019) -
Fabrication and characterization of GaN-based light-emitting diodes without pre-activation of p-type GaN
por: Hu, Xiao-Long, et al.
Publicado: (2015)