Cargando…

Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device

Using x-ray magnetic spectroscopy with in-situ electrical characterizations, we investigated the effects of external voltage on the spin-electronic and transport properties at the interface of a Fe/ZnO device. Layer-, element-, and spin-resolved information of the device was obtained by cross-tuning...

Descripción completa

Detalles Bibliográficos
Autores principales: Chang, Shu-Jui, Chang, Po-Chun, Lin, Wen-Chin, Lo, Shao-Hua, Chang, Liang-Chun, Lee, Shang-Fan, Tseng, Yuan-Chieh
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5428722/
https://www.ncbi.nlm.nih.gov/pubmed/28336961
http://dx.doi.org/10.1038/s41598-017-00547-4
_version_ 1783235886835564544
author Chang, Shu-Jui
Chang, Po-Chun
Lin, Wen-Chin
Lo, Shao-Hua
Chang, Liang-Chun
Lee, Shang-Fan
Tseng, Yuan-Chieh
author_facet Chang, Shu-Jui
Chang, Po-Chun
Lin, Wen-Chin
Lo, Shao-Hua
Chang, Liang-Chun
Lee, Shang-Fan
Tseng, Yuan-Chieh
author_sort Chang, Shu-Jui
collection PubMed
description Using x-ray magnetic spectroscopy with in-situ electrical characterizations, we investigated the effects of external voltage on the spin-electronic and transport properties at the interface of a Fe/ZnO device. Layer-, element-, and spin-resolved information of the device was obtained by cross-tuning of the x-ray mode and photon energy, when voltage was applied. At the early stage of the operation, the device exhibited a low-resistance state featuring robust Fe-O bonds. However, the Fe-O bonds were broken with increasing voltage. Breaking of the Fe-O bonds caused the formation of oxygen vacancies and resulted in a high-resistance state. Such interface reconstruction was coupled to a charge-transfer effect via Fe-O hybridization, which suppressed/enhanced the magnetization/coercivity of Fe electronically. Nevertheless, the interface became stabilized with the metallic phase if the device was continuously polarized. During this stage, the spin-polarization of Fe was enhanced whereas the coercivity was lowered by voltage, but changes of both characteristics were reversible. This stage is desirable for spintronic device applications, owing to a different voltage-induced electronic transition compared to the first stage. The study enabled a straightforward detection of the spin-electronic state at the ferromagnet-semiconductor interface in relation to the transport and reversal properties during operation process of the device.
format Online
Article
Text
id pubmed-5428722
institution National Center for Biotechnology Information
language English
publishDate 2017
publisher Nature Publishing Group UK
record_format MEDLINE/PubMed
spelling pubmed-54287222017-05-15 Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device Chang, Shu-Jui Chang, Po-Chun Lin, Wen-Chin Lo, Shao-Hua Chang, Liang-Chun Lee, Shang-Fan Tseng, Yuan-Chieh Sci Rep Article Using x-ray magnetic spectroscopy with in-situ electrical characterizations, we investigated the effects of external voltage on the spin-electronic and transport properties at the interface of a Fe/ZnO device. Layer-, element-, and spin-resolved information of the device was obtained by cross-tuning of the x-ray mode and photon energy, when voltage was applied. At the early stage of the operation, the device exhibited a low-resistance state featuring robust Fe-O bonds. However, the Fe-O bonds were broken with increasing voltage. Breaking of the Fe-O bonds caused the formation of oxygen vacancies and resulted in a high-resistance state. Such interface reconstruction was coupled to a charge-transfer effect via Fe-O hybridization, which suppressed/enhanced the magnetization/coercivity of Fe electronically. Nevertheless, the interface became stabilized with the metallic phase if the device was continuously polarized. During this stage, the spin-polarization of Fe was enhanced whereas the coercivity was lowered by voltage, but changes of both characteristics were reversible. This stage is desirable for spintronic device applications, owing to a different voltage-induced electronic transition compared to the first stage. The study enabled a straightforward detection of the spin-electronic state at the ferromagnet-semiconductor interface in relation to the transport and reversal properties during operation process of the device. Nature Publishing Group UK 2017-03-23 /pmc/articles/PMC5428722/ /pubmed/28336961 http://dx.doi.org/10.1038/s41598-017-00547-4 Text en © The Author(s) 2017 This work is licensed under a Creative Commons Attribution 4.0 International License. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in the credit line; if the material is not included under the Creative Commons license, users will need to obtain permission from the license holder to reproduce the material. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/
spellingShingle Article
Chang, Shu-Jui
Chang, Po-Chun
Lin, Wen-Chin
Lo, Shao-Hua
Chang, Liang-Chun
Lee, Shang-Fan
Tseng, Yuan-Chieh
Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title_full Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title_fullStr Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title_full_unstemmed Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title_short Voltage-induced Interface Reconstruction and Electrical Instability of the Ferromagnet-Semiconductor Device
title_sort voltage-induced interface reconstruction and electrical instability of the ferromagnet-semiconductor device
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5428722/
https://www.ncbi.nlm.nih.gov/pubmed/28336961
http://dx.doi.org/10.1038/s41598-017-00547-4
work_keys_str_mv AT changshujui voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT changpochun voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT linwenchin voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT loshaohua voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT changliangchun voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT leeshangfan voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice
AT tsengyuanchieh voltageinducedinterfacereconstructionandelectricalinstabilityoftheferromagnetsemiconductordevice