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Optimized process for fabrication of free-standing silicon nanophotonic devices
A detailed procedure is presented for fabrication of free-standing silicon photonic devices that accurately reproduces design dimensions while minimizing surface roughness. By reducing charging effects during inductively coupled-plasma reactive ion etching, undercutting in small, high-aspect ratio o...
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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American Vacuum Society
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5429187/ https://www.ncbi.nlm.nih.gov/pubmed/28630799 http://dx.doi.org/10.1116/1.4983173 |