Cargando…

Room-temperature field effect transistors with metallic ultrathin TiN-based channel prepared by atomic layer delta doping and deposition

Metallic channel transistors have been proposed as the candidate for sub-10 nm technology node. However, the conductivity modulation in metallic channels can only be observed at low temperatures usually below 100 K. In this study, room-temperature field effect and modulation of the channel resistanc...

Descripción completa

Detalles Bibliográficos
Autores principales:	Cheng, Po-Hsien, Wang, Chun-Yuan, Chang, Teng-Jan, Shen, Tsung-Han, Cai, Yu-Syuan, Chen, Miin-Jang
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	Nature Publishing Group UK 2017
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5429830/ https://www.ncbi.nlm.nih.gov/pubmed/28408744 http://dx.doi.org/10.1038/s41598-017-00986-z

Ejemplares similares

Plasma Enhanced Atomic Layer Deposition of Plasmonic TiN Ultrathin Films Using TDMATi and NH(3)
por: Hansen, Katherine, et al.
Publicado: (2020)

Atomic Layer Deposition of Ternary Indium/Tin/Aluminum Oxide Thin Films, Their Characterization and Transistor Performance under Illumination.
por: Büschges, M. Isabelle, et al.
Publicado: (2021)

Parameter Space of Atomic Layer Deposition of Ultrathin Oxides on Graphene
por: Aria, Adrianus I., et al.
Publicado: (2016)

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

Effect of annealing treatments on CeO(2) grown on TiN and Si substrates by atomic layer deposition
por: Vangelista, Silvia, et al.
Publicado: (2018)

Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone
por: Kalam, Kristjan, et al.
Publicado: (2023)

Ultrathin Hematite Photoanode with Gradient Ti Doping
por: Liu, Pengfei, et al.
Publicado: (2020)

Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hyo Jin K., et al.
Publicado: (2019)

Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing
por: Shih, Huan-Yu, et al.
Publicado: (2017)

Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
por: Krýsová, Hana, et al.
Publicado: (2021)

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells
por: Woo, Hyun-Jae, et al.
Publicado: (2021)

Flexible 3D Electrodes of Free-Standing TiN Nanotube Arrays Grown by Atomic Layer Deposition with a Ti Interlayer as an Adhesion Promoter
por: Yun, Seokjung, et al.
Publicado: (2020)

Atomic Layer Deposition of Metal Oxides and Chalcogenides for High Performance Transistors
por: Shen, Chengxu, et al.
Publicado: (2022)

AlN epitaxy on SiC by low-temperature atomic layer deposition via layer-by-layer, in situ atomic layer annealing
por: Kao, Wei-Chung, et al.
Publicado: (2019)

Effect of Thermal Budget on the Electrical Characterization of Atomic Layer Deposited HfSiO/TiN Gate Stack MOSCAP Structure
por: Khan, Z. N., et al.
Publicado: (2016)

Overall reaction mechanism for a full atomic layer deposition cycle of W films on TiN surfaces: first-principles study
por: Park, Hwanyeol, et al.
Publicado: (2018)

Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition
por: Ye, Zhi-Yuan, et al.
Publicado: (2013)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition
por: Tamm, Aile, et al.
Publicado: (2021)

Tantalum-Doped TiO(2) Prepared by Atomic Layer Deposition and Its Application in Perovskite Solar Cells
por: Hsu, Chia-Hsun, et al.
Publicado: (2021)

Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl(4)) Precursor
por: Lee, Woo-Jae, et al.
Publicado: (2020)

Comparison of the cohesive and delamination fatigue properties of atomic-layer-deposited alumina and titania ultrathin protective coatings deposited at 200 °C
por: Sadeghi-Tohidi, Farzad, et al.
Publicado: (2014)

Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications
por: Jewel, Mohi Uddin, et al.
Publicado: (2019)

Construction of Ultrathin Layered MXene-TiN Heterostructure Enabling Favorable Catalytic Ability for High-Areal-Capacity Lithium–Sulfur Batteries
por: Wang, Hao, et al.
Publicado: (2022)

Improving Performance of Tin-Doped-Zinc-Oxide Thin-Film Transistors by Optimizing Channel Structure
por: Chen, Zhuofa, et al.
Publicado: (2019)

SERS Taper-Fiber Nanoprobe Modified by Gold Nanoparticles Wrapped with Ultrathin Alumina Film by Atomic Layer Deposition
por: Xu, Wenjie, et al.
Publicado: (2017)

Effect of atomic layer deposition temperature on the performance of top-down ZnO nanowire transistors
por: Sultan, Suhana M, et al.
Publicado: (2014)

Fully transparent flexible tin-doped zinc oxide thin film transistors fabricated on plastic substrate
por: Han, Dedong, et al.
Publicado: (2016)

HfS(2) thin films deposited at room temperature by an emerging technique, solution atomic layer deposition
por: Cao, Yuanyuan, et al.
Publicado: (2021)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Electrodeposited Ultrathin TiO2 Blocking Layers for Efficient Perovskite Solar Cells
por: Su, Tzu-Sen, et al.
Publicado: (2015)

Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017)

Investigation of the Optoelectronic Properties of Ti-doped Indium Tin Oxide Thin Film
por: Pu, Nen-Wen, et al.
Publicado: (2015)

Wide-range and area-selective threshold voltage tunability in ultrathin indium oxide transistors
por: Tseng, Robert, et al.
Publicado: (2023)

Structural properties of ultrathin SrO film deposited on SrTiO(3)
por: Gagnidze, Tornike, et al.
Publicado: (2019)

Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs
por: Yeh, Yen-Wei, et al.
Publicado: (2021)

Room-temperature bonding of Al(2)O(3) thin films deposited using atomic layer deposition
por: Takakura, Ryo, et al.
Publicado: (2023)

Solution-Processed Silicon Doped Tin Oxide Thin Films and Thin-Film Transistors Based on Tetraethyl Orthosilicate
por: He, Ziyan, et al.
Publicado: (2022)

Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
por: Van Toan, Nguyen, et al.
Publicado: (2021)

Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film
por: Tamm, Aile, et al.
Publicado: (2021)

Cannot write session to /tmp/vufind_sessions/sess_ljs0cqnj7vn5q1cvbqp50eue5e