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Achieving unlimited recording length in interference lithography via broad-beam scanning exposure with self-referencing alignment
Large-area holographic gratings are of great importance in diverse fields including long-range interference metrology, high-resolution astronomical telescopes, and chirped-pulse-amplification systems. However, in conventional interference lithography, the recording length is limited by the aperture...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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Nature Publishing Group UK
2017
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5430446/ https://www.ncbi.nlm.nih.gov/pubmed/28424475 http://dx.doi.org/10.1038/s41598-017-01099-3 |