Thin Film Deposition Using Energetic Ions

One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assi...

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Detalles Bibliográficos
Autores principales: Manova, Darina, Gerlach, Jürgen W., Mändl, Stephan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2010
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/
https://www.ncbi.nlm.nih.gov/pubmed/28883323
http://dx.doi.org/10.3390/ma3084109

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/
https://www.ncbi.nlm.nih.gov/pubmed/28883323
http://dx.doi.org/10.3390/ma3084109

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