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Thin Film Deposition Using Energetic Ions

One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assi...

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Detalles Bibliográficos
Autores principales: Manova, Darina, Gerlach, Jürgen W., Mändl, Stephan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2010
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/
https://www.ncbi.nlm.nih.gov/pubmed/28883323
http://dx.doi.org/10.3390/ma3084109
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author Manova, Darina
Gerlach, Jürgen W.
Mändl, Stephan
author_facet Manova, Darina
Gerlach, Jürgen W.
Mändl, Stephan
author_sort Manova, Darina
collection PubMed
description One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes.
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spelling pubmed-54458272017-07-28 Thin Film Deposition Using Energetic Ions Manova, Darina Gerlach, Jürgen W. Mändl, Stephan Materials (Basel) Review One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. MDPI 2010-07-29 /pmc/articles/PMC5445827/ /pubmed/28883323 http://dx.doi.org/10.3390/ma3084109 Text en © 2010 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/).
spellingShingle Review
Manova, Darina
Gerlach, Jürgen W.
Mändl, Stephan
Thin Film Deposition Using Energetic Ions
title Thin Film Deposition Using Energetic Ions
title_full Thin Film Deposition Using Energetic Ions
title_fullStr Thin Film Deposition Using Energetic Ions
title_full_unstemmed Thin Film Deposition Using Energetic Ions
title_short Thin Film Deposition Using Energetic Ions
title_sort thin film deposition using energetic ions
topic Review
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/
https://www.ncbi.nlm.nih.gov/pubmed/28883323
http://dx.doi.org/10.3390/ma3084109
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