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Thin Film Deposition Using Energetic Ions
One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assi...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2010
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/ https://www.ncbi.nlm.nih.gov/pubmed/28883323 http://dx.doi.org/10.3390/ma3084109 |
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author | Manova, Darina Gerlach, Jürgen W. Mändl, Stephan |
author_facet | Manova, Darina Gerlach, Jürgen W. Mändl, Stephan |
author_sort | Manova, Darina |
collection | PubMed |
description | One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. |
format | Online Article Text |
id | pubmed-5445827 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2010 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-54458272017-07-28 Thin Film Deposition Using Energetic Ions Manova, Darina Gerlach, Jürgen W. Mändl, Stephan Materials (Basel) Review One important recent trend in deposition technology is the continuous expansion of available processes towards higher ion assistance with the subsequent beneficial effects to film properties. Nowadays, a multitude of processes, including laser ablation and deposition, vacuum arc deposition, ion assisted deposition, high power impulse magnetron sputtering and plasma immersion ion implantation, are available. However, there are obstacles to overcome in all technologies, including line-of-sight processes, particle contaminations and low growth rates, which lead to ongoing process refinements and development of new methods. Concerning the deposited thin films, control of energetic ion bombardment leads to improved adhesion, reduced substrate temperatures, control of intrinsic stress within the films as well as adjustment of surface texture, phase formation and nanotopography. This review illustrates recent trends for both areas; plasma process and solid state surface processes. MDPI 2010-07-29 /pmc/articles/PMC5445827/ /pubmed/28883323 http://dx.doi.org/10.3390/ma3084109 Text en © 2010 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution license (http://creativecommons.org/licenses/by/3.0/). |
spellingShingle | Review Manova, Darina Gerlach, Jürgen W. Mändl, Stephan Thin Film Deposition Using Energetic Ions |
title | Thin Film Deposition Using Energetic Ions |
title_full | Thin Film Deposition Using Energetic Ions |
title_fullStr | Thin Film Deposition Using Energetic Ions |
title_full_unstemmed | Thin Film Deposition Using Energetic Ions |
title_short | Thin Film Deposition Using Energetic Ions |
title_sort | thin film deposition using energetic ions |
topic | Review |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5445827/ https://www.ncbi.nlm.nih.gov/pubmed/28883323 http://dx.doi.org/10.3390/ma3084109 |
work_keys_str_mv | AT manovadarina thinfilmdepositionusingenergeticions AT gerlachjurgenw thinfilmdepositionusingenergeticions AT mandlstephan thinfilmdepositionusingenergeticions |