Atomic layer etching of graphene through controlled ion beam for graphene-based electronics

The electronic and optical properties of graphene are greatly dependent on the the number of layers. For the precise control of the graphene layers, atomic layer etching (ALE), a cyclic etching method achieved through chemical adsorption and physical desorption, can be the most powerful technique du...

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Detalles Bibliográficos
Autores principales: Kim, Ki Seok, Ji, You Jin, Nam, Yeonsig, Kim, Ki Hyun, Singh, Eric, Lee, Jin Yong, Yeom, Geun Young
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5446397/
https://www.ncbi.nlm.nih.gov/pubmed/28550291
http://dx.doi.org/10.1038/s41598-017-02430-8

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5446397/
https://www.ncbi.nlm.nih.gov/pubmed/28550291
http://dx.doi.org/10.1038/s41598-017-02430-8

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