Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications

New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba(0.96)Ca(0.04)Ti(0.82)Zr(0.18)O(3) (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (...

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Detalles Bibliográficos
Autores principales: Reynolds, Glyn J., Kratzer, Martin, Dubs, Martin, Felzer, Heinz, Mamazza, Robert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2012
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5448959/
https://www.ncbi.nlm.nih.gov/pubmed/28816997
http://dx.doi.org/10.3390/ma5040575

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5448959/
https://www.ncbi.nlm.nih.gov/pubmed/28816997
http://dx.doi.org/10.3390/ma5040575

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