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Sputtered Modified Barium Titanate for Thin-Film Capacitor Applications
New apparatus and a new process for the sputter deposition of modified barium titanate thin-films were developed. Films were deposited at temperatures up to 900 °C from a Ba(0.96)Ca(0.04)Ti(0.82)Zr(0.18)O(3) (BCZTO) target directly onto Si, Ni and Pt surfaces and characterized by X-ray diffraction (...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2012
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5448959/ https://www.ncbi.nlm.nih.gov/pubmed/28816997 http://dx.doi.org/10.3390/ma5040575 |