Structural Color Filters Enabled by a Dielectric Metasurface Incorporating Hydrogenated Amorphous Silicon Nanodisks

It is advantageous to construct a dielectric metasurface in silicon due to its compatibility with cost-effective, mature processes for complementary metal-oxide-semiconductor devices. However, high-quality crystalline-silicon films are difficult to grow on foreign substrates. In this work, we propos...

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Detalles Bibliográficos
Autores principales: Park, Chul-Soon, Shrestha, Vivek Raj, Yue, Wenjing, Gao, Song, Lee, Sang-Shin, Kim, Eun-Soo, Choi, Duk-Yong
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5451390/
https://www.ncbi.nlm.nih.gov/pubmed/28566739
http://dx.doi.org/10.1038/s41598-017-02911-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5451390/
https://www.ncbi.nlm.nih.gov/pubmed/28566739
http://dx.doi.org/10.1038/s41598-017-02911-w

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