Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates

Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 μm/h on silicon, and 4 μm/h on Ti–6Al–4V were achieved. In a chemistry of H(2)/CH(4)/N(2), varying ratios of CH(4)/H(2) and N(2)/CH(4)...

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Detalles Bibliográficos
Autores principales: Samudrala, Gopi K., Vohra, Yogesh K., Walock, Michael J., Miles, Robin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453140/
https://www.ncbi.nlm.nih.gov/pubmed/28788461
http://dx.doi.org/10.3390/ma7010365

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453140/
https://www.ncbi.nlm.nih.gov/pubmed/28788461
http://dx.doi.org/10.3390/ma7010365

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