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Rapid Growth of Nanostructured Diamond Film on Silicon and Ti–6Al–4V Alloy Substrates
Nanostructured diamond (NSD) films were grown on silicon and Ti–6Al–4V alloy substrates by microwave plasma chemical vapor deposition (MPCVD). NSD Growth rates of 5 μm/h on silicon, and 4 μm/h on Ti–6Al–4V were achieved. In a chemistry of H(2)/CH(4)/N(2), varying ratios of CH(4)/H(2) and N(2)/CH(4)...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2014
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453140/ https://www.ncbi.nlm.nih.gov/pubmed/28788461 http://dx.doi.org/10.3390/ma7010365 |