Erbium-Doped Amorphous Carbon-Based Thin Films: A Photonic Material Prepared by Low-Temperature RF-PEMOCVD

The integration of photonic materials into CMOS processing involves the use of new materials. A simple one-step metal-organic radio frequency plasma enhanced chemical vapor deposition system (RF-PEMOCVD) was deployed to grow erbium-doped amorphous carbon thin films (a-C:(Er)) on Si substrates at low...

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Detalles Bibliográficos
Autores principales: Hsu, Hui-Lin, Leong, Keith R., Teng, I-Ju, Halamicek, Michael, Juang, Jenh-Yih, Jian, Sheng-Rui, Qian, Li, Kherani, Nazir P.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2014
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453272/
https://www.ncbi.nlm.nih.gov/pubmed/28788530
http://dx.doi.org/10.3390/ma7031539

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453272/
https://www.ncbi.nlm.nih.gov/pubmed/28788530
http://dx.doi.org/10.3390/ma7031539

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