Cargando…
Lanthanum Gadolinium Oxide: A New Electronic Device Material for CMOS Logic and Memory Devices
A comprehensive study on the ternary dielectric, LaGdO(3), synthesized and qualified in our laboratory as a novel high-k dielectric material for logic and memory device applications in terms of its excellent features that include a high linear dielectric constant (k) of ~22 and a large energy bandga...
Autores principales: | Pavunny, Shojan P., Scott, James F., Katiyar, Ram S. |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2014
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5453369/ https://www.ncbi.nlm.nih.gov/pubmed/28788589 http://dx.doi.org/10.3390/ma7042669 |
Ejemplares similares
-
Comprehensive Study of Lanthanum Aluminate High-Dielectric-Constant Gate Oxides for AdvancedCMOS Devices
por: Suzuki, Masamichi
Publicado: (2012) -
Process Optimization of Via Plug Multilevel Interconnections in CMOS Logic Devices
por: Cui, Yinhua, et al.
Publicado: (2019) -
VLSI and post-CMOS electronics: devices, circuits and interconnects
por: Dhiman, Rohit, et al.
Publicado: (2019) -
Non-Polar and Complementary Resistive Switching Characteristics in Graphene Oxide devices with Gold Nanoparticles: Diverse Approach for Device Fabrication
por: Khurana, Geetika, et al.
Publicado: (2019) -
EE-ACML: Energy-Efficient Adiabatic CMOS/MTJ Logic for CPA-Resistant IoT Devices †
por: Kahleifeh, Zachary, et al.
Publicado: (2021)