Method for Aluminum Oxide Thin Films Prepared through Low Temperature Atomic Layer Deposition for Encapsulating Organic Electroluminescent Devices

Preparation of dense alumina (Al(2)O(3)) thin film through atomic layer deposition (ALD) provides a pathway to achieve the encapsulation of organic light emitting devices (OLED). Unlike traditional ALD which is usually executed at higher reaction n temperatures that may affect the performance of OLE...

Descripción completa

Detalles Bibliográficos
Autores principales: Li, Hui-Ying, Liu, Yun-Fei, Duan, Yu, Yang, Yong-Qiang, Lu, Yi-Nan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455283/
https://www.ncbi.nlm.nih.gov/pubmed/28787960
http://dx.doi.org/10.3390/ma8020600

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455283/
https://www.ncbi.nlm.nih.gov/pubmed/28787960
http://dx.doi.org/10.3390/ma8020600

Ejemplares similares