Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions

We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows the coating of heat-sensitive materials, while working at atmospheric pressure would simplify the sc...

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Detalles Bibliográficos
Autores principales: Valdesueiro, David, Meesters, Gabrie M. H., Kreutzer, Michiel T., van Ommen, J. Ruud
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455438/
https://www.ncbi.nlm.nih.gov/pubmed/28788000
http://dx.doi.org/10.3390/ma8031249

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455438/
https://www.ncbi.nlm.nih.gov/pubmed/28788000
http://dx.doi.org/10.3390/ma8031249

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