Effect of Annealing Temperature and Oxygen Flow in the Properties of Ion Beam Sputtered SnO(2−x) Thin Films

Tin oxide (SnO(2−x)) thin films were prepared under various flow ratios of O(2)/(O(2) + Ar) on unheated glass substrate using the ion beam sputtering (IBS) deposition technique. This work studied the effects of the flow ratio of O(2)/(O(2) + Ar), chamber pressures and post-annealing treatment on the...

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Detalles Bibliográficos
Autores principales: Wang, Chun-Min, Huang, Chun-Chieh, Kuo, Jui-Chao, Sahu, Dipti Ranjan, Huang, Jow-Lay
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2015
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455525/
https://www.ncbi.nlm.nih.gov/pubmed/28793504
http://dx.doi.org/10.3390/ma8085243

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5455525/
https://www.ncbi.nlm.nih.gov/pubmed/28793504
http://dx.doi.org/10.3390/ma8085243

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