Nanotextured Shrink Wrap Superhydrophobic Surfaces by Argon Plasma Etching

We present a rapid, simple, and scalable approach to achieve superhydrophobic (SH) substrates directly in commodity shrink wrap film utilizing Argon (Ar) plasma. Ar plasma treatment creates a stiff skin layer on the surface of the shrink film. When the film shrinks, the mismatch in stiffness between...

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Detalles Bibliográficos
Autores principales: Nokes, Jolie M., Sharma, Himanshu, Tu, Roger, Kim, Monica Y., Chu, Michael, Siddiqui, Ali, Khine, Michelle
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456652/
https://www.ncbi.nlm.nih.gov/pubmed/28773318
http://dx.doi.org/10.3390/ma9030196

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456652/
https://www.ncbi.nlm.nih.gov/pubmed/28773318
http://dx.doi.org/10.3390/ma9030196

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