Pulsed Laser Porosification of Silicon Thin Films

We present a new and simple laser-based process to porosify thin film silicon using a pulsed laser. During deposition, we incorporate gas atoms or molecules into the Si thin film. Pulsed laser radiation of wavelength [Formula: see text] heats up thin film Si beyond its melting point. Upon heating, g...

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Detalles Bibliográficos
Autores principales: Sämann, Christian, Köhler, Jürgen R., Dahlinger, Morris, Schubert, Markus B., Werner, Jürgen H.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2016
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456937/
https://www.ncbi.nlm.nih.gov/pubmed/28773630
http://dx.doi.org/10.3390/ma9070509

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5456937/
https://www.ncbi.nlm.nih.gov/pubmed/28773630
http://dx.doi.org/10.3390/ma9070509

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