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Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory

Here, we present evidence of self-compliant and self-rectifying bipolar resistive switching behavior in Ni/SiN(x)/n(+) Si and Ni/SiN(x)/n(++) Si resistive-switching random access memory devices. The Ni/SiN(x)/n(++) Si device’s Si bottom electrode had a higher dopant concentration (As ion > 10(19)...

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Detalles Bibliográficos
Autores principales: Kim, Sungjun, Chang, Yao-Feng, Kim, Min-Hwi, Kim, Tae-Hyeon, Kim, Yoon, Park, Byung-Gook
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459000/
https://www.ncbi.nlm.nih.gov/pubmed/28772819
http://dx.doi.org/10.3390/ma10050459
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author Kim, Sungjun
Chang, Yao-Feng
Kim, Min-Hwi
Kim, Tae-Hyeon
Kim, Yoon
Park, Byung-Gook
author_facet Kim, Sungjun
Chang, Yao-Feng
Kim, Min-Hwi
Kim, Tae-Hyeon
Kim, Yoon
Park, Byung-Gook
author_sort Kim, Sungjun
collection PubMed
description Here, we present evidence of self-compliant and self-rectifying bipolar resistive switching behavior in Ni/SiN(x)/n(+) Si and Ni/SiN(x)/n(++) Si resistive-switching random access memory devices. The Ni/SiN(x)/n(++) Si device’s Si bottom electrode had a higher dopant concentration (As ion > 10(19) cm(−3)) than the Ni/SiN(x)/n(+) Si device; both unipolar and bipolar resistive switching behaviors were observed for the higher dopant concentration device owing to a large current overshoot. Conversely, for the device with the lower dopant concentration (As ion < 10(18) cm(−3)), self-rectification and self-compliance were achieved owing to the series resistance of the Si bottom electrode.
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spelling pubmed-54590002017-07-28 Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory Kim, Sungjun Chang, Yao-Feng Kim, Min-Hwi Kim, Tae-Hyeon Kim, Yoon Park, Byung-Gook Materials (Basel) Article Here, we present evidence of self-compliant and self-rectifying bipolar resistive switching behavior in Ni/SiN(x)/n(+) Si and Ni/SiN(x)/n(++) Si resistive-switching random access memory devices. The Ni/SiN(x)/n(++) Si device’s Si bottom electrode had a higher dopant concentration (As ion > 10(19) cm(−3)) than the Ni/SiN(x)/n(+) Si device; both unipolar and bipolar resistive switching behaviors were observed for the higher dopant concentration device owing to a large current overshoot. Conversely, for the device with the lower dopant concentration (As ion < 10(18) cm(−3)), self-rectification and self-compliance were achieved owing to the series resistance of the Si bottom electrode. MDPI 2017-04-26 /pmc/articles/PMC5459000/ /pubmed/28772819 http://dx.doi.org/10.3390/ma10050459 Text en © 2017 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Kim, Sungjun
Chang, Yao-Feng
Kim, Min-Hwi
Kim, Tae-Hyeon
Kim, Yoon
Park, Byung-Gook
Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title_full Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title_fullStr Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title_full_unstemmed Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title_short Self-Compliant Bipolar Resistive Switching in SiN-Based Resistive Switching Memory
title_sort self-compliant bipolar resistive switching in sin-based resistive switching memory
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459000/
https://www.ncbi.nlm.nih.gov/pubmed/28772819
http://dx.doi.org/10.3390/ma10050459
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