Investigations on the Role of N(2):(N(2) + CH(4)) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature

Nanostructured hydrogenated carbon nitride (CN(x):H) thin films were synthesized on a crystal silicon substrate at low deposition temperature by radio-frequency plasma-enhanced chemical vapor deposition (PECVD). Methane and nitrogen were the precursor gases used in this deposition process. The effec...

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Detalles Bibliográficos
Autores principales: Khanis, Noor Hamizah, Ritikos, Richard, Ahmad Kamal, Shafarina Azlinda, Abdul Rahman, Saadah
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459170/
https://www.ncbi.nlm.nih.gov/pubmed/28772460
http://dx.doi.org/10.3390/ma10020102

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5459170/
https://www.ncbi.nlm.nih.gov/pubmed/28772460
http://dx.doi.org/10.3390/ma10020102

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