Preparing local strain patterns in graphene by atomic force microscope based indentation

Patterning graphene into various mesoscopic devices such as nanoribbons, quantum dots, etc. by lithographic techniques has enabled the guiding and manipulation of graphene’s Dirac-type charge carriers. Graphene, with well-defined strain patterns, holds promise of similarly rich physics while avoidin...

Descripción completa

Detalles Bibliográficos
Autores principales: Nemes-Incze, Péter, Kukucska, Gergő, Koltai, János, Kürti, Jenő, Hwang, Chanyong, Tapasztó, Levente, Biró, László P.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5465061/
https://www.ncbi.nlm.nih.gov/pubmed/28596579
http://dx.doi.org/10.1038/s41598-017-03332-5

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5465061/
https://www.ncbi.nlm.nih.gov/pubmed/28596579
http://dx.doi.org/10.1038/s41598-017-03332-5

Ejemplares similares