Atomic rearrangement of a sputtered MoS(2) film from amorphous to a 2D layered structure by electron beam irradiation

We synthesised a crystalline MoS(2) film from as-sputtered amorphous film by applying an electron beam irradiation (EBI) process. A collimated electron beam (60 mm dia.) with an energy of 1 kV was irradiated for only 1 min to achieve crystallisation without an additional heating process. After the E...

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Detalles Bibliográficos
Autores principales: Kim, Bong Ho, Gu, Hyun Ho, Yoon, Young Joon
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5478615/
https://www.ncbi.nlm.nih.gov/pubmed/28634333
http://dx.doi.org/10.1038/s41598-017-04222-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5478615/
https://www.ncbi.nlm.nih.gov/pubmed/28634333
http://dx.doi.org/10.1038/s41598-017-04222-6

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