Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors

The data and complementary information presented hare are related to the research article of “http://dx.doi.org/10.1016/j.matdes.2017.02.016; Materials and Design 120 (2017) 99–108” [1]. The article provides data and information on the case of atomic layer deposition (ALD) of ultra-thin two-dimensio...

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Autores principales: Zhuiykov, Serge, Akbari, Mohammad Karbalaei, Hai, Zhenyin, Xue, Chenyang, Xu, Hongyan, Hyde, Lachlan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Elsevier 2017
Materias:
Data Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5480828/
https://www.ncbi.nlm.nih.gov/pubmed/28664177
http://dx.doi.org/10.1016/j.dib.2017.06.013
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author Zhuiykov, Serge
Akbari, Mohammad Karbalaei
Hai, Zhenyin
Xue, Chenyang
Xu, Hongyan
Hyde, Lachlan
author_facet Zhuiykov, Serge
Akbari, Mohammad Karbalaei
Hai, Zhenyin
Xue, Chenyang
Xu, Hongyan
Hyde, Lachlan
author_sort Zhuiykov, Serge
collection PubMed
description The data and complementary information presented hare are related to the research article of “http://dx.doi.org/10.1016/j.matdes.2017.02.016; Materials and Design 120 (2017) 99–108” [1]. The article provides data and information on the case of atomic layer deposition (ALD) of ultra-thin two-dimensional TiO(2) film. The chemical structure of precursors, and the fabrication process were illustrated. The data of spectral ellipsometric measurements and the methods of calculations were presented. Data of root mean square roughness and the average roughness of the ADL TiO(2) film are presented. The method of bandgap measurements and the bandgap calculation are also explained in the present data article.
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spelling pubmed-54808282017-06-29 Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors Zhuiykov, Serge Akbari, Mohammad Karbalaei Hai, Zhenyin Xue, Chenyang Xu, Hongyan Hyde, Lachlan Data Brief Data Article The data and complementary information presented hare are related to the research article of “http://dx.doi.org/10.1016/j.matdes.2017.02.016; Materials and Design 120 (2017) 99–108” [1]. The article provides data and information on the case of atomic layer deposition (ALD) of ultra-thin two-dimensional TiO(2) film. The chemical structure of precursors, and the fabrication process were illustrated. The data of spectral ellipsometric measurements and the methods of calculations were presented. Data of root mean square roughness and the average roughness of the ADL TiO(2) film are presented. The method of bandgap measurements and the bandgap calculation are also explained in the present data article. Elsevier 2017-06-09 /pmc/articles/PMC5480828/ /pubmed/28664177 http://dx.doi.org/10.1016/j.dib.2017.06.013 Text en © 2017 The Authors http://creativecommons.org/licenses/by/4.0/ This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
spellingShingle Data Article
Zhuiykov, Serge
Akbari, Mohammad Karbalaei
Hai, Zhenyin
Xue, Chenyang
Xu, Hongyan
Hyde, Lachlan
Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title_full Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title_fullStr Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title_full_unstemmed Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title_short Data set for fabrication of conformal two-dimensional TiO(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (TDMAT) and H(2)O precursors
title_sort data set for fabrication of conformal two-dimensional tio(2) by atomic layer deposition using tetrakis (dimethylamino) titanium (tdmat) and h(2)o precursors
topic Data Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5480828/
https://www.ncbi.nlm.nih.gov/pubmed/28664177
http://dx.doi.org/10.1016/j.dib.2017.06.013
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