The relation between residual stress, interfacial structure and the joint property in the SiO(2f)/SiO(2)-Nb joints

In order to achieve a high-quality joint between SiO(2f)/SiO(2) and metals, it is necessary to address the poor wettability of SiO(2f)/SiO(2) and the high residual stress in SiO(2f)/SiO(2)-Nb joint. Here, we simultaneously realize good wettability and low residual stress in SiO(2f)/SiO(2)-Nb joint b...

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Detalles Bibliográficos
Autores principales: Ma, Qiang, Li, Zhuo Ran, Yang, Lai Shan, Lin, Jing Huang, Ba, Jin, Wang, Ze Yu, Qi, Jun Lei, Feng, Ji Cai
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2017
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5482827/
https://www.ncbi.nlm.nih.gov/pubmed/28646185
http://dx.doi.org/10.1038/s41598-017-04531-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5482827/
https://www.ncbi.nlm.nih.gov/pubmed/28646185
http://dx.doi.org/10.1038/s41598-017-04531-w

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