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The relation between residual stress, interfacial structure and the joint property in the SiO(2f)/SiO(2)-Nb joints
In order to achieve a high-quality joint between SiO(2f)/SiO(2) and metals, it is necessary to address the poor wettability of SiO(2f)/SiO(2) and the high residual stress in SiO(2f)/SiO(2)-Nb joint. Here, we simultaneously realize good wettability and low residual stress in SiO(2f)/SiO(2)-Nb joint b...
Autores principales: | Ma, Qiang, Li, Zhuo Ran, Yang, Lai Shan, Lin, Jing Huang, Ba, Jin, Wang, Ze Yu, Qi, Jun Lei, Feng, Ji Cai |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Nature Publishing Group UK
2017
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC5482827/ https://www.ncbi.nlm.nih.gov/pubmed/28646185 http://dx.doi.org/10.1038/s41598-017-04531-w |
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